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About: Multiple patterning     Goto   Sponge   NotDistinct   Permalink

An Entity of Type : dbo:ProgrammingLanguage, within Data Space : dbpedia.demo.openlinksw.com associated with source document(s)

Type: programming language New Facet based on Instances of this Class

Multiple patterning (or multi-patterning) is a class of technologies for manufacturing integrated circuits (ICs), developed for photolithography to enhance the feature density. It is expected to be necessary for the 10 nm and 7 nm node semiconductor processes and beyond. The premise is that a single lithographic exposure may not be enough to provide sufficient resolution. Hence additional exposures would be needed, or else positioning patterns using etched feature sidewalls (using spacers) would be necessary.