About: 10 µm process

Facets (new session)
Description
Metadata
Settings
- Rule:
- Inverse Functional Properties:
- "Same As":

About: 10 µm process Goto Sponge NotDistinct Permalink

An Entity of Type : yago:Whole100003553, within Data Space : dbpedia.demo.openlinksw.com associated with source document(s)
QRcode icon

http://dbpedia.demo.openlinksw.com/describe/?url=http%3A%2F%2Fdbpedia.org%2Fresource%2F10_µm_process&invfp=IFP_OFF&sas=SAME_AS_OFF

The 10 μm process is the level of MOSFET semiconductor process technology that was commercially reached around 1971, by leading semiconductor companies such as RCA and Intel.

Attributes	Values
rdf:type	yago:WikicatMicroprocessors yago:Artifact100021939 yago:Chip103020034 yago:Conductor103088707 yago:Device103183080 yago:Instrumentality103575240 yago:Microprocessor103760310 yago:Object100002684 yago:PhysicalEntity100001930 yago:SemiconductorDevice104171831 yago:Whole100003553
rdfs:label	عملية 10 ميكرومتر (ar) 10 µm process (en) Proceso de 10 µm (es) 10 µm (it) 10 µm (fr) 10 µm 공정 (ko) 10 µm (pt) 10微米制程 (zh)
rdfs:comment	عملية 10 ميكرومتر عملية 10 ميكرومتر (بالإنجليزية: 10 µm process)‏ عملية تشير إلى مستوى عملية تصنيع تقنية أشباه الموصلات التي تم التوصل إليها بحدود العامين 1971 و1972 ميلادي من قبل الشركات الرائدة في مجال أشباه الموصلات، مثل إنتل. (ar) The 10 μm process is the level of MOSFET semiconductor process technology that was commercially reached around 1971, by leading semiconductor companies such as RCA and Intel. (en) El proceso de 10 µm se refiere a una tecnología de proceso de semiconductores producidos en los años 1971 y 1972 por las principales empresas de semiconductores como Intel. (es) 10 µm (ou encore 10 000 nm) est un processus de fabrication appartenant à la technologie des semi-conducteurs. Cette technologie a été atteinte par Intel, la principale industrie de semi-conducteurs dans les années 1971-1972. Le successeur de ce procédé utilise une largeur de canal de 3 µm. (fr) 10 µm(마이크로미터) 공정은 회로선 폭이 10 µm인 반도체를 다루는 공정 기술 수준이다. 1971년에서 1972년 경 인텔과 같은 반도체 회사가 달성하였다. (ko) 10 µm (o 10000 nanometri) è un processo produttivo della tecnologia dei semiconduttori con cui vengono prodotti i circuiti integrati a larghissima scala di integrazione (VLSI). Questa tecnologia fu raggiunta da Intel, la principale industria di semiconduttori, negli anni 1971-1972. Il successore di questo processo utilizza una larghezza di canale di 3 µm. (it) O processo de 10 μm é o nível de tecnologia de processamento de semicondutor MOSFET que foi comercialmente atingiu cerca de 1971, por empresas de semicondutores principais tais como RCA e Intel. Em 1960, o engenheiro egípcio Mohamed M. Atalla e o engenheiro coreano Dawon Kahng, enquanto trabalhavam na Bell Labs, demonstraram os primeiros transistores MOSFET com comprimentos de porta de 20 μm e, em seguida, 10 μm. Em 1969, a Intel lançou o chip 1101 MOS SRAM com um processo de 12 μm. (pt) 10 µm制程是半导体制造制程的一个水平，大约于1971年左右达成。这一制程由当时领先的半导体公司如英特尔所完成。 (zh)
dcterms:subject	1971 introductions International Technology Roadmap for Semiconductors lithography nodes
Wikipage page ID	9758579 (xsd:integer)
Wikipage revision ID	1100016638 (xsd:integer)
Link from a Wikipage to another Wikipage	Dynamic random-access memory Integrated circuit Intel 8008 List of semiconductor scale examples 1971 introductions International Technology Roadmap for Semiconductors lithography nodes MOSFET Semiconductor device fabrication Intel Intel 1103 Intel 4004 Micrometre RCA CPU 6 μm process Semiconductor process technology CD4000
Link from a Wikipage to an external page	https://www.theregister.co.uk/2011/11/15/the_first_forty_years_of_intel_microprocessors/print.html
sameAs	10 µm process 10 µm process 10 µm process 10 µm process 10 µm process 10 µm process 10 µm process 10 µm process 10 µm process 10 µm process
dbp:wikiPageUsesTemplate	dbt:Nano-tech-stub dbt:Nbsp dbt:Semiconductor_manufacturing_processes dbt:Sequence dbt:Use_dmy_dates
list	MOSFET semiconductor device fabrication process (en)
next	6 (xsd:integer)
prev	20 (xsd:integer)
has abstract	عملية 10 ميكرومتر عملية 10 ميكرومتر (بالإنجليزية: 10 µm process)‏ عملية تشير إلى مستوى عملية تصنيع تقنية أشباه الموصلات التي تم التوصل إليها بحدود العامين 1971 و1972 ميلادي من قبل الشركات الرائدة في مجال أشباه الموصلات، مثل إنتل. (ar) The 10 μm process is the level of MOSFET semiconductor process technology that was commercially reached around 1971, by leading semiconductor companies such as RCA and Intel. (en) El proceso de 10 µm se refiere a una tecnología de proceso de semiconductores producidos en los años 1971 y 1972 por las principales empresas de semiconductores como Intel. (es) 10 µm (ou encore 10 000 nm) est un processus de fabrication appartenant à la technologie des semi-conducteurs. Cette technologie a été atteinte par Intel, la principale industrie de semi-conducteurs dans les années 1971-1972. Le successeur de ce procédé utilise une largeur de canal de 3 µm. (fr) 10 µm(마이크로미터) 공정은 회로선 폭이 10 µm인 반도체를 다루는 공정 기술 수준이다. 1971년에서 1972년 경 인텔과 같은 반도체 회사가 달성하였다. (ko) 10 µm (o 10000 nanometri) è un processo produttivo della tecnologia dei semiconduttori con cui vengono prodotti i circuiti integrati a larghissima scala di integrazione (VLSI). Questa tecnologia fu raggiunta da Intel, la principale industria di semiconduttori, negli anni 1971-1972. Il successore di questo processo utilizza una larghezza di canale di 3 µm. (it) O processo de 10 μm é o nível de tecnologia de processamento de semicondutor MOSFET que foi comercialmente atingiu cerca de 1971, por empresas de semicondutores principais tais como RCA e Intel. Em 1960, o engenheiro egípcio Mohamed M. Atalla e o engenheiro coreano Dawon Kahng, enquanto trabalhavam na Bell Labs, demonstraram os primeiros transistores MOSFET com comprimentos de porta de 20 μm e, em seguida, 10 μm. Em 1969, a Intel lançou o chip 1101 MOS SRAM com um processo de 12 μm. (pt) 10 µm制程是半导体制造制程的一个水平，大约于1971年左右达成。这一制程由当时领先的半导体公司如英特尔所完成。 (zh)
gold:hypernym	Level
prov:wasDerivedFrom	wikipedia-en:10_µm_process?oldid=1100016638&ns=0
page length (characters) of wiki page	3089 (xsd:nonNegativeInteger)
foaf:isPrimaryTopicOf	wikipedia-en:10_µm_process
is Link from a Wikipage to another Wikipage of	NMOS logic Dawon Kahng Depletion-load NMOS logic Intel 8008 10 um process Gate array ZMDI 6 µm process History of the transistor Semiconductor device fabrication Digital signal processor CMOS Random-access memory Transistor count 10 µm (semiconductor process) 10 μm process 10µm (semiconductor process)
is Wikipage redirect of	10 um process 10 µm (semiconductor process) 10 μm process 10µm (semiconductor process)

Faceted Search & Find service v1.17_git139 as of Feb 29 2024

Alternative Linked Data Documents: ODE Content Formats:

RDF

ODATA

Microdata

About

OpenLink Virtuoso version 08.03.3330 as of Mar 19 2024, on Linux (x86_64-generic-linux-glibc212), Single-Server Edition (378 GB total memory, 67 GB memory in use)
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2024 OpenLink Software