About: Argon fluoride laser

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The argon fluoride laser (ArF laser) is a particular type of excimer laser, which is sometimes (more correctly) called an exciplex laser. With its 193-nanometer wavelength, it is a deep ultraviolet laser, which is commonly used in the production of semiconductor integrated circuits, eye surgery, micromachining, and scientific research. "Excimer" is short for "excited dimer", while "exciplex" is short for "excited complex". An excimer laser typically uses a mixture of a noble gas (argon, krypton, or xenon) and a halogen gas (fluorine or chlorine), which under suitable conditions of electrical stimulation and high pressure, emits coherent stimulated radiation (laser light) in the ultraviolet range.

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rdf:type	yago:WikicatLasers yago:Artifact100021939 yago:Device103183080 yago:Instrumentality103575240 yago:Laser103643253 yago:Object100002684 yago:OpticalDevice103851341 yago:PhysicalEntity100001930 yago:Whole100003553 yago:WikicatExcimerLasers
rdfs:label	Argon fluoride laser (en) Laser à fluorure d'argon (fr)
rdfs:comment	Un laser à fluorure d'argon, ou laser ArF, est un type particulier de laser à excimère (plus exactement, ici, de laser à exciplexe). (fr) The argon fluoride laser (ArF laser) is a particular type of excimer laser, which is sometimes (more correctly) called an exciplex laser. With its 193-nanometer wavelength, it is a deep ultraviolet laser, which is commonly used in the production of semiconductor integrated circuits, eye surgery, micromachining, and scientific research. "Excimer" is short for "excited dimer", while "exciplex" is short for "excited complex". An excimer laser typically uses a mixture of a noble gas (argon, krypton, or xenon) and a halogen gas (fluorine or chlorine), which under suitable conditions of electrical stimulation and high pressure, emits coherent stimulated radiation (laser light) in the ultraviolet range. (en)
dcterms:subject	Fluorine Argon Excimer lasers
Wikipage page ID	29293276 (xsd:integer)
Wikipage revision ID	1122480053 (xsd:integer)
Link from a Wikipage to another Wikipage	Electrolaser Surface micromachining Fluorine Argon Argon Excimer lasers United States Naval Research Laboratory Inertial confinement fusion Complex (chemistry) Noble gas Moore's law Krypton fluoride laser Spectrum Fused quartz 7 nanometer 800 nanometer Ablation Fluorine Carcinogen LASIK Photolithography Photorefractive keratectomy IBM Integrated circuits Electron volt Ultraviolet Nike laser Repulsive state Extreme ultraviolet lithography Excimer Excimer lamp Excimer laser Microelectronic Moore’s law dbr:Argon_monofluoride
sameAs	Argon fluoride laser Argon fluoride laser Argon fluoride laser Argon fluoride laser Argon fluoride laser
dbp:wikiPageUsesTemplate	dbt:Excimer_lasers dbt:Chem dbt:Reflist
has abstract	The argon fluoride laser (ArF laser) is a particular type of excimer laser, which is sometimes (more correctly) called an exciplex laser. With its 193-nanometer wavelength, it is a deep ultraviolet laser, which is commonly used in the production of semiconductor integrated circuits, eye surgery, micromachining, and scientific research. "Excimer" is short for "excited dimer", while "exciplex" is short for "excited complex". An excimer laser typically uses a mixture of a noble gas (argon, krypton, or xenon) and a halogen gas (fluorine or chlorine), which under suitable conditions of electrical stimulation and high pressure, emits coherent stimulated radiation (laser light) in the ultraviolet range. ArF (and KrF) excimer lasers are widely used in high-resolution photolithography machines, a critical technology for microelectronic chip manufacturing. Excimer laser lithography has enabled transistor feature sizes to shrink from 800 nanometers in 1990 to 7 nanometers in 2018. Extreme ultraviolet lithography machines have replaced ArF photolithography machines in some cases as they enable even smaller feature sizes while increasing productivity, as EUV machines can provide sufficient resolution in fewer steps. The development of excimer laser lithography has been highlighted as one of the major milestones in the 50-year history of the laser. (en) Un laser à fluorure d'argon, ou laser ArF, est un type particulier de laser à excimère (plus exactement, ici, de laser à exciplexe). (fr)
gold:hypernym	Type
prov:wasDerivedFrom	wikipedia-en:Argon_fluoride_laser?oldid=1122480053&ns=0
page length (characters) of wiki page	9265 (xsd:nonNegativeInteger)
foaf:isPrimaryTopicOf	wikipedia-en:Argon_fluoride_laser
is Link from a Wikipage to another Wikipage of	Argon compounds List of laser articles GlobalFoundries Krypton fluoride laser ASML Holding Fluorine Nikon ARF Photolithography Next-generation lithography Ultraviolet Extreme ultraviolet lithography Immersion lithography Excimer Excimer laser ArF laser Argon-fluoride laser
is Wikipage redirect of	ArF laser Argon-fluoride laser
is foaf:primaryTopic of	wikipedia-en:Argon_fluoride_laser

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