A krypton fluoride laser (KrF laser) is a particular type of excimer laser, which is sometimes (more correctly) called an exciplex laser. With its 248 nanometer wavelength, it is a deep ultraviolet laser which is commonly used in the production of semiconductor integrated circuits, industrial micromachining, and scientific research. The term excimer is short for 'excited dimer', while exciplex is short for 'excited complex'. An excimer laser typically contains a mixture of: a noble gas such as argon, krypton, or xenon; and a halogen gas such as fluorine or chlorine. Under suitably intense conditions of electromagnetic stimulation and pressure, the mixture emits a beam of coherent stimulated radiation as laser light in the ultraviolet range.
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| - ليزر فلوريد الكريبتون (ar)
- Láser de fluoruro de kriptón (es)
- Laser à fluorure de krypton (fr)
- Krypton fluoride laser (en)
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| - ليزر فلوريد الكريبتون في الكيمياء والفيزياء (بالإنجليزية: krypton fluoride laser أو (KrF laser)) هو نوع مخصوص من ليزر إكسيمر. (ar)
- Un laser à fluorure de krypton, souvent abrégé en laser KrF, est un type particulier de laser à excimère (qu'on devrait d'ailleurs appeler ici "laser à exciplexe"). (fr)
- Un láser de fluoruro de kriptón (o láser KrF) es un tipo especial de láser de excimero, que a veces es llamado láser de excímeros o láser exciplex. Posee una longitud de onda de 248 nanómetros, y es un láser ultravioleta profundo que se utiliza comúnmente en la producción de circuitos integrados de semiconductores, micromecanizado industrial, y en la investigación científica. (es)
- A krypton fluoride laser (KrF laser) is a particular type of excimer laser, which is sometimes (more correctly) called an exciplex laser. With its 248 nanometer wavelength, it is a deep ultraviolet laser which is commonly used in the production of semiconductor integrated circuits, industrial micromachining, and scientific research. The term excimer is short for 'excited dimer', while exciplex is short for 'excited complex'. An excimer laser typically contains a mixture of: a noble gas such as argon, krypton, or xenon; and a halogen gas such as fluorine or chlorine. Under suitably intense conditions of electromagnetic stimulation and pressure, the mixture emits a beam of coherent stimulated radiation as laser light in the ultraviolet range. (en)
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| - ليزر فلوريد الكريبتون في الكيمياء والفيزياء (بالإنجليزية: krypton fluoride laser أو (KrF laser)) هو نوع مخصوص من ليزر إكسيمر. (ar)
- A krypton fluoride laser (KrF laser) is a particular type of excimer laser, which is sometimes (more correctly) called an exciplex laser. With its 248 nanometer wavelength, it is a deep ultraviolet laser which is commonly used in the production of semiconductor integrated circuits, industrial micromachining, and scientific research. The term excimer is short for 'excited dimer', while exciplex is short for 'excited complex'. An excimer laser typically contains a mixture of: a noble gas such as argon, krypton, or xenon; and a halogen gas such as fluorine or chlorine. Under suitably intense conditions of electromagnetic stimulation and pressure, the mixture emits a beam of coherent stimulated radiation as laser light in the ultraviolet range. KrF and ArF excimer lasers are widely incorporated into high-resolution photolithography machines, one of the critical tools required for microelectronic chip manufacturing in nanometer dimensions. Excimer laser lithography has enabled transistor feature sizes to shrink from 800 nanometers in 1990 to 10 nanometers in 2016. (en)
- Un láser de fluoruro de kriptón (o láser KrF) es un tipo especial de láser de excimero, que a veces es llamado láser de excímeros o láser exciplex. Posee una longitud de onda de 248 nanómetros, y es un láser ultravioleta profundo que se utiliza comúnmente en la producción de circuitos integrados de semiconductores, micromecanizado industrial, y en la investigación científica. El término excimer es la abreviatura de "dímero excitado", mientras que exciplex es la abreviatura de "complejo excitado". Un láser excimer suele utilizar una mezcla de gases nobles (argón, kriptón o xenón) y un gas halógeno (flúor o cloro), que en condiciones adecuadas de estimulación eléctrica y de presión elevada, emite radiación coherente estimulada (luz láser) en el rango ultravioleta. El láser excimer KrF (y el de ArF) son ampliamente utilizados en las máquinas de litografía de circuitos integrados de muy alta resolución (VLSI), una de las tecnologías críticas requeridas para la fabricación de chips microelectrónicos. La litografía de láser excimer, ha permitido que el tamaño de los transistor se reduzca desde 0,5 micrómetros en 1990 a menos de 45 nanómetros en 2010. (es)
- Un laser à fluorure de krypton, souvent abrégé en laser KrF, est un type particulier de laser à excimère (qu'on devrait d'ailleurs appeler ici "laser à exciplexe"). (fr)
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