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About: SU-8 photoresist     Goto   Sponge   NotDistinct   Permalink

An Entity of Type : yago:WikicatPolymers, within Data Space : dbpedia.demo.openlinksw.com associated with source document(s)

Type: yago:Abstraction100002137yago:Chemical114806838yago:Compound114818238yago:Material114580897yago:Matter100020827yago:Part113809207yago:PhysicalEntity100001930yago:Polymer114994328yago:Relation100031921yago:Substance100019613yago:WikicatPolymers New Facet based on Instances of this Class

SU-8 is a commonly used epoxy-based negative photoresist. Negative refers to a photoresist whereby the parts exposed to UV become cross-linked, while the remainder of the film remains soluble and can be washed away during development. As shown in the structural diagram, SU-8 derives its name from the presence of 8 epoxy groups. This is a statistical average per moiety. It is these epoxies that cross-link to give the final structure. SU-8 was originally developed as a photoresist for the microelectronics industry, to provide a high-resolution mask for fabrication of semiconductor devices.