About: Ion beam deposition

Facets (new session)
Description
Metadata
Settings
- Rule:
- Inverse Functional Properties:
- "Same As":

About: Ion beam deposition Goto Sponge NotDistinct Permalink

An Entity of Type : dbo:Election, within Data Space : dbpedia.demo.openlinksw.com associated with source document(s)
QRcode icon

http://dbpedia.demo.openlinksw.com/describe/?url=http%3A%2F%2Fdbpedia.org%2Fresource%2FIon_beam_deposition

Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. Ion optics (such as radio frequency quadrupoles) can be mass selective. In IBD they are used to select a single, or a range of ion species for deposition in order to avoid contamination. For organic materials in particular, this process is often monitored by a mass spectrometer.

Attributes	Values
rdf:type	Election
rdfs:label	Ion beam deposition (en) 이온 빔 퇴적물 (ko)
rdfs:comment	이온 빔 퇴적물(Ion beam deposition, IBD)은 이온 빔의 적용을 통해 표적 물질을 도포하는 과정이다. 이온 빔 퇴적물 장치는 일반적으로 이온원, 이온 광학계 및 퇴적물 표적으로 이루어져 있다. 선택적으로, 질량 분석기는 통합될수 있다. 원자 이온 IBD, , 필드 이온화또는 음극 아크 퇴적물 소스가 사용된다. 음극 아크 소스는 특히 탄소 이온 퇴적물에서 사용된다. 분자 이온 빔 퇴적물은 또는 MALDI 소스를 이용한다. (ko) Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. Ion optics (such as radio frequency quadrupoles) can be mass selective. In IBD they are used to select a single, or a range of ion species for deposition in order to avoid contamination. For organic materials in particular, this process is often monitored by a mass spectrometer. (en)
foaf:depiction
dcterms:subject	Thin film deposition
Wikipage page ID	1592850 (xsd:integer)
Wikipage revision ID	1098420659 (xsd:integer)
Link from a Wikipage to another Wikipage	Carbon Electron ionization Electrospray ionization Sputter deposition Electronvolt Stoichiometry Ion implantation Ion source Thin film deposition Ion beam Cathodic arc deposition MALDI Ion beam assisted deposition Ion beam induced deposition Mass spectrometer Cathodic arc dbr:Penning_ion_source
sameAs	Ion beam deposition Ion beam deposition Ion beam deposition Ion beam deposition
dbp:wikiPageUsesTemplate	dbt:Nano-tech-stub dbt:Unreferenced dbt:Use_dmy_dates
thumbnail	wiki-commons:Special:FilePath/Ion_implanter_schematic.png?width=300
bot	noref (en)
date	June 2019 (en)
has abstract	Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. In the ion source source materials in the form of a gas, an evaporated solid, or a solution (liquid) are ionized. For atomic IBD, electron ionization, field ionization or cathodic arc sources are employed. Cathodic arc sources are used particularly for carbon ion deposition. Molecular ion beam deposition employs electrospray ionization or MALDI sources. The ions are then accelerated, focused or deflected using high voltages or magnetic fields. Optional deceleration at the substrate can be employed to define the deposition energy. This energy usually ranges from a few eV up to a few keV. At low energy molecular ion beams are deposited intact (ion soft landing), while at a high deposition energy molecular ions fragment and atomic ions can penetrate further into the material, a process known as ion implantation. Ion optics (such as radio frequency quadrupoles) can be mass selective. In IBD they are used to select a single, or a range of ion species for deposition in order to avoid contamination. For organic materials in particular, this process is often monitored by a mass spectrometer. The ion beam current, which is quantitative measure for the deposited amount of material, can be monitored during the deposition process. Switching of the selected mass range can be used to define a stoichiometry. (en) 이온 빔 퇴적물(Ion beam deposition, IBD)은 이온 빔의 적용을 통해 표적 물질을 도포하는 과정이다. 이온 빔 퇴적물 장치는 일반적으로 이온원, 이온 광학계 및 퇴적물 표적으로 이루어져 있다. 선택적으로, 질량 분석기는 통합될수 있다. 원자 이온 IBD, , 필드 이온화또는 음극 아크 퇴적물 소스가 사용된다. 음극 아크 소스는 특히 탄소 이온 퇴적물에서 사용된다. 분자 이온 빔 퇴적물은 또는 MALDI 소스를 이용한다. (ko)
gold:hypernym	Process
prov:wasDerivedFrom	wikipedia-en:Ion_beam_deposition?oldid=1098420659&ns=0
page length (characters) of wiki page	2089 (xsd:nonNegativeInteger)
foaf:isPrimaryTopicOf	wikipedia-en:Ion_beam_deposition
is Link from a Wikipage to another Wikipage of	Amorphous carbon Boron Boron nitride Integrator Radiation material science Mechanical filter Ion beam-assisted deposition Ion implantation Mirrored sunglasses Diamond-like carbon Dielectric mirror Thin film Society of Vacuum Coaters Cathodic arc deposition IBD
is Wikipage disambiguates of	IBD
is foaf:primaryTopic of	wikipedia-en:Ion_beam_deposition

Faceted Search & Find service v1.17_git139 as of Feb 29 2024

Alternative Linked Data Documents: ODE Content Formats:

RDF

ODATA

Microdata

About

OpenLink Virtuoso version 08.03.3330 as of Mar 19 2024, on Linux (x86_64-generic-linux-glibc212), Single-Server Edition (378 GB total memory, 67 GB memory in use)
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2024 OpenLink Software