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Statements

Subject Item
dbr:Thermal_laser_stimulation
rdfs:label
Thermal laser stimulation
rdfs:comment
Thermal laser stimulation represents a class of defect imaging techniques which employ a laser to produce a thermal variation in a semiconductor device. This technique may be used for semiconductor failure analysis. There are four techniques associated with thermal laser stimulation: optical beam induced resistance change (OBIRCH), thermally induced voltage alteration (TIVA)), external induced voltage alteration (XIVA) and Seebeck effect imaging (SEI)
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dbc:Semiconductor_analysis
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1070135842
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dbr:Voltage dbr:Electric_current dbr:Semiconductor_device dbr:Electrical_impedance dbr:Electrical_conductor dbr:Thermal_gradient dbr:Metal dbc:Semiconductor_analysis dbr:Laser dbr:Electromigration dbr:University_of_Florida dbr:Electric_potential dbr:Failure_analysis dbr:Seebeck_effect dbr:Power_(physics) dbr:Electrical_short dbr:Electrical_bias dbr:Thermal_transmission dbr:Thermal_management_of_electronic_devices_and_systems dbr:Electrical_resistance dbr:Static_random-access_memory dbr:List_of_laser_articles
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dbo:abstract
Thermal laser stimulation represents a class of defect imaging techniques which employ a laser to produce a thermal variation in a semiconductor device. This technique may be used for semiconductor failure analysis. There are four techniques associated with thermal laser stimulation: optical beam induced resistance change (OBIRCH), thermally induced voltage alteration (TIVA)), external induced voltage alteration (XIVA) and Seebeck effect imaging (SEI)
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wikipedia-en:Thermal_laser_stimulation