. . . . . . . . . . "8457897"^^ . "6693"^^ . "Thermal laser stimulation represents a class of defect imaging techniques which employ a laser to produce a thermal variation in a semiconductor device. This technique may be used for semiconductor failure analysis. There are four techniques associated with thermal laser stimulation: optical beam induced resistance change (OBIRCH), thermally induced voltage alteration (TIVA)), external induced voltage alteration (XIVA) and Seebeck effect imaging (SEI)"@en . . . . . . . . "Thermal laser stimulation"@en . . . "Thermal laser stimulation represents a class of defect imaging techniques which employ a laser to produce a thermal variation in a semiconductor device. This technique may be used for semiconductor failure analysis. There are four techniques associated with thermal laser stimulation: optical beam induced resistance change (OBIRCH), thermally induced voltage alteration (TIVA)), external induced voltage alteration (XIVA) and Seebeck effect imaging (SEI)"@en . . . . . . . "1070135842"^^ . . . . . . .